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Using a Residual Gas Analyzer to Monitor Plasma Cleaning of SEM Chambers and Specimens

Published online by Cambridge University Press:  01 August 2018

Ronald Vane  and
Michael Cable
Ronald Vane
Affiliation:
XEI Scientific Inc, Redwood City, CA.
Michael Cable
Affiliation:
XEI Scientific Inc, Redwood City, CA.

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1152 - 1153
Copyright
© Microscopy Society of America 2018 

References

[1] Kosmowska, E., et al, Microsc. Microanal 23(1 2017) p. 74.Google Scholar
[2] Geltenbort, P., Ezhov, V.F. Ryabov, V.L. Technical Physics Letters 35(8 2009) p. 700.Google Scholar