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Analysis of PEDOT:PSS Films After Sulfuric Acid Treatment on Silicon and Fused Silica using FT-IR and UV-VIS

Published online by Cambridge University Press:  08 March 2016

Emma G. Langford ,
Kenneth D. Shaughnessy ,
Thomas C. Devore ,
David Lawrence  and
Costel Constantin
Emma G. Langford
Affiliation:
Department of Chemistry and Biochemistry, James Madison University, Harrisonburg, Virginia 22807
Kenneth D. Shaughnessy
Affiliation:
Department of Physics and Astronomy, James Madison University, Harrisonburg, Virginia 22807
Thomas C. Devore
Affiliation:
Department of Chemistry and Biochemistry, James Madison University, Harrisonburg, Virginia 22807
David Lawrence
Affiliation:
Department of Integrated Science and Technology, James Madison University, Harrisonburg, Virginia 22807
Costel Constantin*
Affiliation:
Department of Physics and Astronomy, James Madison University, Harrisonburg, Virginia 22807
*
*(Email: constacx@jmu.edu)
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Abstract

Thin films of organic semiconductor PEDOT:PSS deposited onto silicon and fused silica substrates. These films were then treated with sulfuric acid (H2SO4) for various amounts of time (i.e., 10, 20, 40, 60, and 80 minutes). Preliminary results obtained with FT-IR, UV-VIS, and Van DerPauw conductivity methods suggest that the H2SO4 removes the PSS isonomer from the PEDOT:PSS system. This PSS removal also induces a decrease in film thickness.

Keywords

polymerorganicsemiconducting
Type
Articles
Information
MRS Advances , Volume 1 , Issue 7: Electronics and Photonics , 2016 , pp. 465 - 469
Copyright
Copyright © Materials Research Society 2016 

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References

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