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Voltage-controlled reactive magnetron sputtering of Nb-doped TiO2 films: electrical and optical properties

Published online by Cambridge University Press:  28 April 2016

Stefan Seeger ,
Klaus Ellmer ,
Michael Weise ,
Johanna Reck  and
Rainald Mientus
Stefan Seeger*
Affiliation:
Optotransmitter-Umweltschutz-Technologie e.V., Köpenicker Str. 325, 12555 Berlin, Germany
Klaus Ellmer
Affiliation:
Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
Michael Weise
Affiliation:
Optotransmitter-Umweltschutz-Technologie e.V., Köpenicker Str. 325, 12555 Berlin, Germany
Johanna Reck
Affiliation:
Optotransmitter-Umweltschutz-Technologie e.V., Köpenicker Str. 325, 12555 Berlin, Germany
Rainald Mientus
Affiliation:
Optotransmitter-Umweltschutz-Technologie e.V., Köpenicker Str. 325, 12555 Berlin, Germany
*
*(Email: seeger@out-ev.de)
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Abstract

Niobium-doped TiO2 films as highly transparent conducting oxidic electrodes were prepared by reactive magnetron sputtering from a titanium target in an argon-oxygen gas flow. As-deposited films were amorphous and exhibited high resistivities ranging from 10 to 1×105 Ω cm in dependence on the deposition parameters. We stabilized the reactive magnetron sputtering deposition by adjusting the magnetron discharge voltage at a constant oxygen gas flow. The precise process control during the preparation of the as-deposited films was essential to gain low resistivities (10-3 Ω cm) and low optical absorption coefficients (α550nm < 2×103 cm-1) after annealing. These polycrystalline TiO2:Nb films on borosilicate glass show a quite high electron concentration > 1×1020 cm-3 and a high carrier mobility (≈ 8 cm2 V-1 s-1).

Keywords

thin filmsputteringelectrical properties
Type
Articles
Information
MRS Advances , Volume 1 , Issue 46: Energy and Environment , 2016 , pp. 3139 - 3144
Copyright
Copyright © Materials Research Society 2016 

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References

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