Principle Editors

Guillermo Ameer, Northwestern University, USA

Mitchell Anstey, Sandia National Laboratories, USA

Haleh Ardebili, University of Houston, USA

David Armstrong, University of Oxford, UK

Jean-Charles Arnault, CEA LIST, France

Viktoriia Babicheva, Georgia State University, USA

Ningzhong Bao, Nanjing Tech University, China

Jason Bara, University of Alabama, USA

Katia Bertoldi, Harvard University, USA

Karlheinz Bock, TU Dresden, Germany

Paddy K.L. Chan, University of Hong Kong, Hong Kong

Ali Chirazi, FEI Application Software Group, France

Thomas Cooper, Air Force Research Laboratory, USA

Shadi Dayeh, University of California, San Diego, USA

Tao Deng, Shanghai Jiao Tong University, China

Chaitanya S. Deo, Georgia Institute of Technology, USA

Paola Deplano, University of Cagliari, Italy

Heifang Ding, Nanjing University, China

Chuanhua Duan, Boston University, USA

Paul Evans, University of Wisconsin-Madison, USA

Lan Fu, Australian National University, Australia

Jacek Furdyna, University of Notre Dame, USA

Sharon Gerecht, John Hopkins University, USA

Talia Gershon, IBM T. J. Watson Research Center, USA

David Ginley, National Renewable Energy Laboratory, USA

Alexander Govorov, Ohio University, USA

Ke Han, Florida State University, USA

Stephen Harris, Lawrence Berkeley National Laboratory, USA

Anita Ho-Baillie, The University of New South Wales, Australia

Sang Ho Oh, Pohang University of Science and Techology, South Korea

Yanglong Hou, Peking University, China

Hyunsang Hwang, Pohang University of Science and Techology, South Korea

Olindo Isabella, Delft University of Technology, The Netherlands

De-en Jiang, University of California, Riverside, USA

Zakya Kafafi, Lehigh University, USA

Wonmo Kang, U.S. Naval Research Laboratory, USA

Manish Keswani, University of Arizona, USA

Daniel Kiener, Montan Universityersität Leoben, Austria

Dae-Hyeong Kim, Seoul National University, South Korea

Takanobu Kiss, Kyushu University, Japan

Coskun Kocabas, Bilkent University, Turkey

Norbert Koch, Humboldt University, Germany

Marisol Koslowski, Purdue University, USA

Martin Kuball, University of Bristol, UK

Andreas Lendlein, Helmholtz-Zentrum Geesthacht GmbH, Germany

Darren Lipomi, University of California-San Diego, USA

Johan Liu, Chalmers University of Technology, Sweden

Li Liu, Rensselaer Polytechnic Institute, USA

Yang Yang Li, City University of Hong Kong, Hong Kong

Yat Li, University of California-Santa Cruz, USA

Alfred Ludwig, Ruhr University-Bochum, Germany

Enrique Martinez, Los Alamos National Laboratory, USA

Naoki Matsuda, National Institute of Advanced Industrial Science and Technology, Japan

Yurong Ma, Peking University, China

Martyn McLachlan, Imperial College London, UK

Al Meldrum, University of Alberta, Canada

Kash Mittal, Reviews of Adhesion and Adhesives, USA

Masaaki Nagatsu, Shizuoka University, Japan

Robert Nemanich, Arizona State University, USA

Dragomir Neshev, Australian National Universit, Australia

Paul Ohodnicki, National Energy Tech Laboratory, USA

Mariappan Parans Paranthaman, Oak Ridge National Laboratory, USA

Jang Ung Park, Ulsan National Institute of Science and Technology, South Korea

Julien Pernot, University of Grenoble Alpes, France

Ketul C. Popat, Colorado State University, USA

Nini Pryds, Technical University of Denmark, Denmark

Regina Ragan, University of California, USA

Sebastian Reineke, Technische Universität Dresden, Germany

Yuta Saito, National Institute of Advanced Industrial Science and Technology, Japan

Clara Santato, Ecole Polytechnique-Montreal, Canada

Michele Sessolo, University of Valencia, Spain

Yuyan Shao, Pacific Northwest National Laboratory, USA

Robert Sinclair, Stanford University, USA

Susan Sinnott, The Pennsylvania State University, USA

Nian Sun, Northeastern University, USA

Yugang Sun, Argonne National Laboratory, USA

Seiichi Takamatsu, National Institute of Advanced Industrial Science and Technology , Japan

Maria Tamargo, The City College of New York, USA

Chee Hing Tan, University of Sheffield, UK

Rita Toth, Empa, Switzerland

Peter Trefonas, Dow Electronic Materials, USA

Aurélien Vattré, CEA, France

Fred Walker, Yale University, USA

Thomas Walther, University of Sheffield, UK

Donghai Wang, The Pennsylvania State University, USA

Haidan Wen, Argonne National Laboratory, USA

Ashley White, Lawrence Berkeley National Laboratory, USA

Karl Whittle, University of Liverpool, UK

Ming Xu, Huazhong University of Science and Technology, China

Masashi Yamaguchi, Rensselaer Polytechnic Institute, USA

Yaroslava Yingling, North Carolina State University, USA

Carl-Mikael Zetterling, KTH Royal Institute of Technology, Sweden

Jie Zheng, University of Akron, USA

Jia Zhu, Nanjing University, China

Yuntian Zhu, North Carolina State University, USA

Volume 1|Scientific Basis for Nuclear Waste Management XXXIX

Nicolas Clavier, CNRS, France

Nicolas Dacheux, Université de Montpellier, France

Christophe Poinssot, CEA Marcoule, France