Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-19T13:06:54.457Z Has data issue: false hasContentIssue false

Advances In Analytical Auger Electron Spectroscopy

Published online by Cambridge University Press:  29 November 2013

Get access

Abstract

Fundamental principles and experimental procedures for fully utilizing the power of Auger analysis are discussed. Topics include: quantitative analysis, high resolution imaging, depth profiling, and noise reduction. These studies reveal several improvements that might be expected in the immediate future and how they might be achieved. Some knowledge of Auger spectroscopy is assumed, but references on theory, principles, instrumentation, and applications are cited.

Type
Materials Microanalysis
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Chang, C.C., J. Vac. Sci. Technol. 18(2) (1981) p. 276.CrossRefGoogle Scholar
2.Chang, C.C., in Characterization of Solid Surfaces, edited by Kane, P.F. and Larrabee, G.B. (Plenum, New York, 1974) Chapter 20.Google Scholar
3.Chang, C.C., Surf. Sci. 48 (1975) p. 9.CrossRefGoogle Scholar
4.Chattarji, D., The Theory of Auger Transitions (Academic Press, New York, 1976). Note: excellent review of theory using a single set of notations; second half of book is an enlightened survey of experimental and applied Auger analysis; treatment of Chang's derivation (Ref. 2) has typographical errors.Google Scholar
5.Electron Spectroscopy: Theory, Techniques, and Applications, edited by Brundle, C.R. and Baker, A.D.: (a) Vol. I, 1977; (b) Vol. II, 1978; (c) Vol. III, 1979; and (d) Vol. IV, 1981.Google Scholar
6.Practical Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy, edited by Briggs, D. and Seah, M.P. (J. Wiley, New York, 1983).Google Scholar
7.Thin Film and Depth Profile Analysis,” in Topics in Current Physics Vol. 37, edited by Oechsner, H. (Springer-Verlag, New York, 1984).Google Scholar
8.Bindell, J.B., in VLSI Technology, edited by Sze, S.M. (McGraw-Hill, New York, 2nd edition to be published in 1988).Google Scholar
9.Benninghoven, A., Rudenauer, F.G., and Werner, H.W., Secondary Ion Mass Spectrometry—Basic Concepts, Instrumental Aspects, Applications and Trends (Wiley, New York, 1987).Google Scholar
10.Mitchell, I.V., Phys. Bull. 30 (1979) p. 23.CrossRefGoogle Scholar
11.Taglauer, E. and Heiland, W., Appl. Phys. 9 (1976) p. 261.CrossRefGoogle Scholar
12.Weber, R.E., Peria, W.T., J. Appl. Phys. 38 (1967) p. 4355.CrossRefGoogle Scholar
13.Chang, C.C., Appl. Phys. Lett. 31(4) (1977) p. 304.CrossRefGoogle Scholar
14.Hall, P.M. and Morabito, J.M., Surf. Sci. 83 (1979) p. 391.CrossRefGoogle Scholar
15.Chang, C.C. and Boulin, D.M., Surf. Sci. 69 (1977) p. 385.CrossRefGoogle Scholar
16.Davis, L.E., MacDonald, N.C., Palmberg, P.W., Riach, G.E., and Weber, R.E., Handbook of Auger Electron Spectroscopy (Physical Electronics, Eden Prairie, MN, 1978).Google Scholar
17.Topics in Applied Physics, edited by Behrisch, R. (Springer-Verlag, New York): (a) Sputtering by Particle Bombardment I, Vol. 47 (1981); (b) Sputtering by Particle Bombardment II, Vol. 52 (1983).Google Scholar
18.Zalar, A., Thin Solid Films 124 (1985) p. 223.CrossRefGoogle Scholar
19.Gaarenstroom, S.W. and Waldo, R.A., Appl. of Surf. Sci. 18 (1984) p. 223.CrossRefGoogle Scholar