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Dewetting of Co thin films obtained by atomic layer deposition due to the thermal reduction process

Published online by Cambridge University Press:  11 September 2017

Daniela Alburquenque ,
Victoria Bracamonte ,
Marcela Del Canto ,
Alejandro Pereira  and
Juan Escrig Open the ORCID record for Juan Escrig [Opens in a new window]
Daniela Alburquenque
Affiliation:
Departamento de Física, Universidad de Santiago de Chile, 9170124 Santiago, Chile
Victoria Bracamonte
Affiliation:
Facultad de Matemática, Astronomía, Física y Computación (FaMAF), Universidad Nacional de Córdoba, IFEG, CONICET, Córdoba, Argentina
Marcela Del Canto
Affiliation:
Center for the Development of Nanoscience and Nanotechnology, 9170124 Santiago, Chile
Alejandro Pereira
Affiliation:
Center for the Development of Nanoscience and Nanotechnology, 9170124 Santiago, Chile
Juan Escrig*
Affiliation:
Departamento de Física, Universidad de Santiago de Chile, 9170124 Santiago, Chile Center for the Development of Nanoscience and Nanotechnology, 9170124 Santiago, Chile
*
Address all correspondence to Juan Escrig at juan.escrig@usach.cl
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Abstract

Cobalt oxide thin films with different thicknesses were synthesized by atomic layer deposition. After a thermal reduction process, under a controlled atmosphere of hydrogen, it was possible to convert cobalt oxide to metallic cobalt. The different thicknesses were obtained considering from 500 to 2000 cycles of CoCp2/O3. The thin films were characterized by x-ray diffraction, scanning electron microscopy, energy-dispersive x-ray microanalysis, and by magneto-optical Kerr effect measurements. The indirect synthesis process allows us to obtain cobalt oxide and cobalt thin films with controlled thicknesses and extraordinary magnetic properties, with coercivities above 500 Oe.

Type
Research Letters
Information
MRS Communications , Volume 7 , Issue 4 , December 2017 , pp. 848 - 853
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Copyright
Copyright © Materials Research Society 2017 

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