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Ablation of UV-Transparent Materials with Femtosecond UV Excimer Laser Pulses

Published online by Cambridge University Press:  25 February 2011

S. Küper  and
M. Stuke
S. Küper
Affiliation:
Max-Planck-Institut f. biophys. Chemie Dept. Laserphysik, P.O. 2841, D-3400 Göttingen, F.R. Germany
M. Stuke
Affiliation:
Max-Planck-Institut f. biophys. Chemie Dept. Laserphysik, P.O. 2841, D-3400 Göttingen, F.R. Germany
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Abstract

Experiments on the ablation of undoped polytetrafluoroethylene (teflon), monocrystalline sodium chloride (NaCl) and polymethyl-methacrylate (PMMA) with 300 fs uv excimer laser pulses at 248 nm are reported. In contrast to standard 16 ns excimer laser pulses, these ultrashort pulses ablate essentially uv-transparent materials, heretofore not accessible to clean ablation, with good edge quality and no signs of thermal damage, with removal rates are on the order of one micrometer per pulse.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 375
Copyright
Copyright © Materials Research Society 1989

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References

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