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Adsorbed Tma on Dielectric Oxide Surfaces
Published online by Cambridge University Press: 26 February 2011
Abstract
Trimethyl aluminum vapor is found to chemisorb on the surface of silicon dioxide and aluminum oxide via reaction with surface hydroxyl groupe. In addition to the chemisorbed layer, trimethyl aluminum also forms a weakly bound multilayer consisting of molecular dimers.
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- Research Article
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- Copyright © Materials Research Society 1998
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