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An Atom Probe Field Ion Microscope Investigation Of The Role Of Boron In Precipitates And At Grain Boundaries In NiAl

Published online by Cambridge University Press:  25 February 2011

Raman Jayaram  and
M. K. Miller
Raman Jayaram
Affiliation:
Metals and Ceramics Division Oak Ridge National Laboratory Oak Ridge, TN 37831–6376
M. K. Miller
Affiliation:
Metals and Ceramics Division Oak Ridge National Laboratory Oak Ridge, TN 37831–6376
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Abstract

The high resolution analytical technique of Atom Probe Field Ion Microscopy (APFTM) haseen used to characterize grain boundaries and the matrix of a stoichiometric NiAl alloy doped with 0.04 (100 wppm) and 0.12 at. % (300 wppm) boron. Field ion images revealed boron segregation to the grain boundaries. Atom probe elemental analysis of the grain boundaries measured a boron coverage of up to 30% of a monolayer. Extensive atom probe analyses also revealed a fine dispersion of nanoscale boride precipitates in the matrix. The boron segregation to the grain boundaries was found to correlate with the observed suppression of intergranular fracture. However, the decrease in ductility of boron-doped NiAl is attributed in part to the precipitation hardening effect of the boride phases.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 238: Symposium Cb – Structure and Properties of Interfaces in Materials , 1991 , 445
Copyright
Copyright © Materials Research Society 1992

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