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Atomically Resolved Imaging of Epitaxial CaF2 on Si(111) using Noncontact Atomic Force Microscope

Published online by Cambridge University Press:  01 February 2011

Yoshihide Seino
Affiliation:
Handai Frontier Research Center (FRC), Osaka University, 2–1 Yamada-oka, Suita, Osaka 565–0871, Japan
Masayuki Abe
Affiliation:
Handai Frontier Research Center (FRC), Osaka University, 2–1 Yamada-oka, Suita, Osaka 565–0871, Japan Graduate School of Engineering, Osaka University, 2–1 Yamada-oka, Suita, Osaka 565–0871, Japan
Seizo Morita
Affiliation:
Handai Frontier Research Center (FRC), Osaka University, 2–1 Yamada-oka, Suita, Osaka 565–0871, Japan Graduate School of Engineering, Osaka University, 2–1 Yamada-oka, Suita, Osaka 565–0871, Japan
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Abstract

Epitaxial calcium fluoride (CaF2) film surfaces grown on Si(111) were imaged with the atomic force microscopy operated in the noncontact mode in ultrahigh vacuum. Our experimental results reproducibly reveal two kind of topographic patterns with the atomic scale contrast. The line profiles obtained from the topographic image exhibit that the change of tip-polarity plays the important role for obtaining two atomic corrugation patterns by considering the interaction between the tip and the two topmost surface atoms. It is similar to the results from the literature obtained on the cleaved CaF2 surface with both positively and negatively terminated tip.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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