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Beam Processing in Silicon Device Technology

Published online by Cambridge University Press:  15 February 2011

C. Hill
C. Hill
Affiliation:
Plessey Research (Caswell) Limited, Allen Clark Research Centre, Caswell, Towcester, Northants., England.
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Abstract

Three modes of beam processing are distinguished, characterised by the heat pulse duration. The suitability of each of these modes as a process step in integrated circuit fabrication is discussed with reference to six criteria for applicability. Some conclusions are made as to the eventual application of each mode of processing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1: Symposium – Laser and Electron-Beam Solid Interactions in Materials Processing , 1980 , 361
Copyright
Copyright © Materials Research Society 1981

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References

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