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Channeling Investigation of the Lattice Location of Ti in Ti-Implanted Optical Waveguides in LiNbO3

Published online by Cambridge University Press:  26 February 2011

Ch. Buchal ,
S. Mantl  and
D. K. Thomas
Ch. Buchal
Affiliation:
IFF/KFA, D-5170 Jülich, W. Germany
S. Mantl
Affiliation:
IFF/KFA, D-5170 Jülich, W. Germany
D. K. Thomas
Affiliation:
Solid State Div., ORNL, Oak Ridge, TN 37831
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Abstract

Ion channeling of 3 MeV He ions has been employed to investigate the lattice location of Ti in Ti implanted optical waveguides in LiNbO3 after Solid Phase Epitaxy. Particle-Induced X-rays (PIXE) from Ti at 4.5 keY (K∝) and Nb at 2.2 keV (L∝β) and 16.6 keV (K∝) have been detected and analyzed simultaneously.

All scans yield similar behaviour of the Ti and the Nb signals. This provides clear evidence, that within well annealed implanted waveguides the Ti4+ and the Nb5+ ions occupy equivalent lattice positions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 100: Symposium – A Fundamentals of Beam-Solid Interactions and Transient Thermal Processing , 1988 , 317
Copyright
Copyright © Materials Research Society 1988

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References

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