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The characteristics of dc glow discharge and its effects on enhancement of diamond nucleation in HF-CVD system

Published online by Cambridge University Press:  10 February 2011

Z. Xu ,
R. J. Narayan ,
J. Narayan  and
J. Sankar
Z. Xu
Affiliation:
NSF Center for Advanced Materials and Smart Structures Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC27695-7916, USA
R. J. Narayan
Affiliation:
NSF Center for Advanced Materials and Smart Structures Department of Mechanical Engineering, North Carolina A&T State University, Greensboro, NC 27411, USA School of Medicine, Wake Forest University, Winston,-Salem, NC27157
J. Narayan
Affiliation:
NSF Center for Advanced Materials and Smart Structures
J. Sankar
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC27695-7916, USA
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Abstract

We have investigated enhancement of diamond nucleation due to electrode biasing and compared these results with those obtained using substrate biasing. The electrode biasing results in near-surface dc glow discharge with characteristic negative glows and dark regions on both sides of the electrode (cathode). We have studied systematically diamond nucleation density as a function of substrate location with respect to the electrode and gas pressure. Using scanning electron microscopy and Raman spectroscopy, we have determined that a significant enhancement up to 109 cm-2 in diamond nucleation is achieved when the substrate is located in the negative glow region of the near-surface dc glow discharge. It is also found that gas pressure enhances nucleation site density but the quality of diamond decreases. The optimization of these parameters in obtaining high-quality diamond films is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 233
Copyright
Copyright © Materials Research Society 1999

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References

1. Chang, R. P. H., Nelson, David, Hiraki, A., Technology update on diamondflms, MRS Proceedings (EA-19), 1990 Google Scholar
2. NARAYAN, J., J. Mat. Res. 5, 2414 (1990)Google Scholar
3. Narayan, J., Godbole, V. P., Matera, G., J. Appl. Phys. 71, 966 (1992)Google Scholar
4. Chen, X., Narayan, J., J. Appl. Phys. 74, 4168 (1992)Google Scholar
5. Godbole, V. P., Jagannadham, K., Narayan, J., Appl. Phys. Lett. 67, 1322 (1995)Google Scholar
6. Nishimura, Kobashi, K., Kawate, Y., Holuchi, T., Phys. Rev. B 38, 4067 (1988).Google Scholar
7. Huimin Lin, David Dandy, S., Diamond Relat. Mater. 4,1173 (1995).Google Scholar
8. Lambrecht, W. R. L., Lee, C. H., Segall, B., Angus, J. C., Li, Z., Sunkara, M., Nature 364, 607 (1993).Google Scholar
9. Reinke, P., Kania, P., Oelhafen, P., Thin Solid Films 270, 124 (1995).Google Scholar
10. Schreck, M., ThOrer, K. -H., Stritzker, B., J. Appl. Phys. 81, 3092 (1997).Google Scholar
11. Wolter, S. D., McClure, M. T., Glass, J. T., Stoner, B. R., App. Phys. Lett. 66, 2810 (1995).Google Scholar
12. Nishitani-Gamo, Mikka, J. Mater. Res. 12, 1351 (1997).Google Scholar
13. Wolter, S. D., Borst, T. H., Vescan, A., Kohn, E., Appl. Phys. Lett. 68, 3558 (1996).Google Scholar
14. Irwin, M. D., Pantano, C. G., Gluche, P., Kohn, E., Appl. Phys. Lett. 71, 716 (1997).Google Scholar
15. Cui, Jingbiao, Fang, Rongchuan, Appl. Phys. Lett. 69, 3507 (1996).Google Scholar
16. Seong, Tae-Yeon, Kim, Do-Geun, choi, Kwang-Ki, Appl. Phys. Lett. 70, 3368 (1997).Google Scholar
17. Zhu, W., Sivazlian, F. R., Stoner, B. R., Glass, J. T., J. Mater. Res. 10, 425 (1995).Google Scholar
18. Lior, Gouzman, I., Hoffman, A., Appl. Phys. Lett. 72, 296 (1998).Google Scholar
19. Chen, Q., Z. Lin. Appl. Phys. Lett. 68, 2450 (1996).Google Scholar
20. Sánchez, G., Wang, W. L., Polo, M. C., Esteve, J., Diamond Relat. Mater. 4, 200 (1998).Google Scholar
21. Papoular, R., Electrical Phenomena in Gases (Americam Elsevier Publishing Company, Inc., (1965)Google Scholar
22. Payling, R., Jones, D. G., Bengtson, A., Glow Discharge Optical Emission Spectrometry (John Wiley & Sons Ltd, 1997)Google Scholar