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Characterization of Surface Cleans by Surface Photovoltage and Surface Charge Imaging

Published online by Cambridge University Press:  21 February 2011

John Lowell ,
Valerie Wenner  and
Lubek Jastrzebski
John Lowell
Affiliation:
Advanced Micro Devices, 5204 E Ben While Blvd., Austin, TX 78741 Science & Technology Center, Univ. of Texas, Austin, TX 78712
Valerie Wenner
Affiliation:
Advanced Micro Devices, 5204 E Ben While Blvd., Austin, TX 78741
Lubek Jastrzebski
Affiliation:
Center for Microelectronics Research, Univ. of South Florida, Tampa, FL 33620
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Abstract

To monitor the effectiveness of standard cleaning processes in semiconductor manufacturing, suitable diagnostic procedures must be found. In addition the procedures must be non-contact and non-destructive. Increasingly the techniques of surface photovoltage and surface charge imaging together are finding applications as in-line wafer monitors. This talk will discuss how they are being used to monitor the quality of surface cleaning processes. We will show that if unchecked the "clean" may actually contribute contamination.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 315: Symposium Y – Surface Chemical Cleaning and Passivation for Semiconductor Processing , 1993 , 339
Copyright
Copyright © Materials Research Society 1993

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References

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