Hostname: page-component-77c89778f8-7drxs Total loading time: 0 Render date: 2024-07-19T14:29:26.097Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of the Depositing Flux in Laser Ablation Deposition (LAD).

Published online by Cambridge University Press:  28 February 2011

Jacques C.S. Kools  and
Jan Dieleman
Jacques C.S. Kools
Affiliation:
Philips Research Labs. P.O. Box 80.000 5600 JA Eindhoven, The Netherlands
Jan Dieleman
Affiliation:
Philips Research Labs. P.O. Box 80.000 5600 JA Eindhoven, The Netherlands
Get access

Abstract

Angular-resolved time-of-flight (ARTOF) studies have been performed on ablation plumes of copper generated by excimer laser fluences just above threshold in vacuum. Positive ions, Rydberg atoms and ground-state neutrals are observed. Relative concentrations, angular intensity distributions and angular-resolved velocity distributions are measured for ground state neutrals and ions.

Ions have the highest kinetic energies ( 20–80 eV). Their angular distribution is isotropic. Their concentration at the substrate is very low ( ≤ 10−6). Ground state neutrals have lower energies ( ≈ 1 eV). Their intensity and velocity is a strongly decreasing function of the polar angle. Rydberg-atoms have energies in between those of ground-state neutrals and ions. Their angular distribution is also dependent on the polar angle.

The concentration, kinetic energy and angular distribution of the ionised species arc very well explained by a mechanism of thermal ionization and subsequent space-charge induced repulsion. The velocity distributions and angular intensity distributions of the ground-state neutrals are quantitatively predicted by a model for the flow dynamics of pulsed laser generated gas clouds.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 235: Symposium A – Phase Formation and Modification by Beam-Solid Interactions , 1991 , 819
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1) Kools, J.C.S., Brongersma, S.H., van de Riet, E., and Dieleman, J., Appl. Phys. B53, 125 (1991).Google Scholar
2) Kools, J.C.S., van Ingen, R.P., and Dieleman, J., submitted to J. Appl. Phys.Google Scholar
3) Walkup, R.E., Jasinski, J.M., Dreyfus, R.W., Appl. Phys. Lett, 48, 1690 (1986).Google Scholar
4) Dyer, P.E., Appl. Phys. Lett. 55, 1630 (1989).Google Scholar
5) Saenger, K.L., J.Appl. Phys. 66, 4435 (1989).Google Scholar
6) Viswanathan, R., Hussla, I. in: “Laser Processing and Diagnostics” ed by Bauerle, D., Springer Ser. Chem. Phys. vol 39 ( Springer Berlin/Heidelberg 1984)Google Scholar
7) Dreyfus, R.W., J. Appl. Phys. 69, 1721 (1991)CrossRefGoogle Scholar
8) Kools, J.C.S., Bailer, T.S., De Zwart, S.T., and Dieleman, J., accepted for publication in J. Appl. Phys.Google Scholar
9) Brongersma, S.H., Kools, J.C.S., Bailer, T.S., Beijerick, H.C.W., and Dieleman, J., Appl. Phys. Lett. 59, 1311 (1991).Google Scholar
10) Gupta, A., Braren, B., Casey, K.G., Hussey, B.W., and Kelly, R., Appl. Phys. Lett. 59, 1302 (1991).Google Scholar
11) Gilgenbach, R. and Ventzek, P.L., Appl. Phys. Lett. 58, 1597 (1991).Google Scholar