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Chemoical Vapor Deposotdoo of Tungsten and Molybdenum Folms From m(η3–C3H5)4 (M=Mo, W)

Published online by Cambridge University Press:  15 February 2011

Rein U. Kirss ,
Jian Chen  and
Robert B. Hallock
Rein U. Kirss
Affiliation:
Northeastern University, Department of Chemistry, Boston, MA 02115
Jian Chen
Affiliation:
Northeastern University, Department of Chemistry, Boston, MA 02115
Robert B. Hallock
Affiliation:
Northeastern University, Department of Chemistry, Boston, MA 02115
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Abstract

Chemical vapor deposition using tetra(allyl) tungsten and molybdenum precursors yielded amorphous tungsten and molybdenum carbide films on pyrex substrates. The films were characterized by Auger, ESCA, SEM, XRD and resistivity measurements. Volatile pyrolysis products consisted primarily of propene, C3H6.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 303
Copyright
Copyright © Materials Research Society 1992

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