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Crystallographic Analysis of Cvd Films by Using X-Ray Polychromatic Radiation

Published online by Cambridge University Press:  10 February 2011

B. Lavelle ,
L. Brissonneau ,
E. Baggot  and
C. Vahlas
B. Lavelle
Affiliation:
Centre d'Elaboration de Matériaux et d'Etudes Structurales, CNRS, 29, rue J. Marvig, 31055 Toulouse cedex 4, France, lavelle@cemes.fr
L. Brissonneau
Affiliation:
Laboratoire Matériaux et Interfaces, INPT-CNRS, ENS Chimie de Toulouse, 118, route de Narbonne, 31077 Toulouse cedex 4, France
E. Baggot
Affiliation:
Laboratoire Matériaux et Interfaces, INPT-CNRS, ENS Chimie de Toulouse, 118, route de Narbonne, 31077 Toulouse cedex 4, France
C. Vahlas
Affiliation:
Laboratoire Matériaux et Interfaces, INPT-CNRS, ENS Chimie de Toulouse, 118, route de Narbonne, 31077 Toulouse cedex 4, France, cvahlas@ensct.fr
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Abstract

The Energy Dispersive X-ray Diffiractometry (EDXD) technique was tested for in-situ crystallographic characterization of nickel films processed by chemical vapor deposition (CVD). The diffracted beam at low Bragg angle was analyzed in energy by a solid state detector. A nickel reference sample was used to face the problems of EDXD background signal and uncertainty of sample location. The relative accuracy on lattice parameters measurements is 1.5.10−3, to be compared to 0.5.10−3 for classical (monochromatic) X-Ray diffraction. Texture measurements yields results in agreement with those obtained from recent texture goniometer. Finally, an estimation of the thickness was obtained from the intensity of nickel fluorescence peak. In view of the obtained results, EDXD appears to be a promising technique for in-situ studies. Although less powerful compared to the synchrotron facility, it is more flexible and can be applied at lower cost.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 524: Symposium V – Application of Synchrotron Radiation Techniques…IV , 1998 , 121
Copyright
Copyright © Materials Research Society 1998

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References

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