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Deposition and Modification of Tantalum Carbide Coatings on Graphite by Laser Interactions

Published online by Cambridge University Press:  01 January 1992

James Veligdan
Affiliation:
Reactor Systems Division, Department of Nuclear Energy, Brookhaven National Laboratory, Upton, NY
D. Branch
Affiliation:
Reactor Systems Division, Department of Nuclear Energy, Brookhaven National Laboratory, Upton, NY
P.E. Vanier
Affiliation:
Reactor Systems Division, Department of Nuclear Energy, Brookhaven National Laboratory, Upton, NY
R.E. Barletta
Affiliation:
Reactor Systems Division, Department of Nuclear Energy, Brookhaven National Laboratory, Upton, NY
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Abstract

Graphite surfaces can be hardened and protected from erosion by hydrogen at high temperatures by refractory metal carbide coatings, which are usually prepared by chemical vapor deposition (CVD) or chemical vapor reaction (CVR) methods. These techniques rely on heating the substrate to a temperature where a volatile metal halide decomposes and reacts with either a hydrocarbon gas or with carbon from the substrate. For CVR techniques, deposition temperatures must be in excess of 2000° C in order to achieve favorable deposition kinetics. In an effort to lower the bulk substrate deposition temperature, the use of laser interactions with both the substrate and the metal halide deposition gas has been employed. Initial testing involved the use of a CO2 laser to heat the surface of a graphite substrate and a KrF excimer laser to accomplish a photodecomposition of TaCI5 gas near the substrate. The results of preliminary experiments using these techniques are described.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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