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Large Scale Engineered Nanostructured Surfaces by Reactive Ion Etching with Kinetically Self-Assembled Non-continuous Metal Film as Etching Mask

Published online by Cambridge University Press:  01 February 2011

Wei Wei ,
Mark Bachman  and
Guann-Pyng Li
Wei Wei
Affiliation:
Department of Chemical Engineering and Materials Science Integrated Nanosystems Research Facilities, Henry Samueli School of Engineering University of California, Irvine Irvine, California 92697
Mark Bachman
Affiliation:
Department of Electrical Engineering and Computer Science Integrated Nanosystems Research Facilities, Henry Samueli School of Engineering University of California, Irvine Irvine, California 92697
Guann-Pyng Li
Affiliation:
Department of Chemical Engineering and Materials Science Department of Electrical Engineering and Computer Science Integrated Nanosystems Research Facilities, Henry Samueli School of Engineering University of California, Irvine Irvine, California 92697
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Abstract

In this study, we explored the possibility of using annealed non-continuous metal film enabled etching technique to produce large nano-structured surfaces. Non-continuous Ag film is deposited on silicon wafer with a thin layer of silicon dioxide using E-beam deposition, and then vacuum thermal annealing was applied on the deposited films, causing nano-scaled Ag particles to migrate and agglomerate into self-assembled islands of larger nanometer dimensions. We controlled the density and average size of the metal islands through thickness of the initial film and subsequent annealing rates. Reactive ion etching through the metal islands mask into the underneath silicon dioxide layer was performed following the annealing process. Preliminary hydrophobicity experiments were carried out using the engineered nano-structured surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 849: Symposium KK – Kinetics-Driven Nanopatterning on Surfaces , 2004 , KK8.6
Copyright
Copyright © Materials Research Society 2005

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References

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