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Dominant Midgap Levels in the Compensation Mechanism in GaAs

Published online by Cambridge University Press:  22 February 2011

H. Shiraxi
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1-297 Kitabukuro-cho, Omiya, Saitama, Japan
Y. Tokuda
Affiliation:
Department of Electronics, Aichi Institute of Technology, 1247 Yachigusa Yakusa, Toyota, Aichi, Japan
E. Tohyama
Affiliation:
Department of Electronics, Aichi Institute of Technology, 1247 Yachigusa Yakusa, Toyota, Aichi, Japan
K. Sassa
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1-297 Kitabukuro-cho, Omiya, Saitama, Japan
N. Toyama
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1-297 Kitabukuro-cho, Omiya, Saitama, Japan
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Abstract

Properties of midgap levels in n-type GaAs crystals were studied by using trap density spectroscopy (TDS), capacitance-voltage and near infrared (NIR) absorption measurements. The TDS analysis for various n-type samples showed that the concentrations of the midgap level were from 2.0 × 1016 cm−3 to 3.4 × 1016 cm−3. However, those of EL2 in the same crystals were found to be from 1.1 × 1016 cm−3 to 1.3 × 1016 cm−3 by NIR absorption measurements at room temperature. On the other hand, in undoped semi-insulating GaAs crystals with carbon concentrations ranging from 6 × 1014 cm−3 to 2.4 × 1016 cm−3, the densities of the ionized EL2 determined by NIR absorption were only about 30 % of those of carbon acceptor determined by the localized vibrational mode absorption at room temperature. These differences suggest the presence of another midgap donor which does not give NIR absorption. The concentrations of this trap were estimated to be 0.8 to 1.6 times those of EL2 by decomposition of the TDS spectra into their components.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

1. Winnacker, A., and Zach, F.X., J. Cryst. Growth, 103, 275 (1990)Google Scholar
2. Blakemore, J.S., Sargent, L., and Tang, R S., Appl. Phys. Lett., 54, 2106 (1989).CrossRefGoogle Scholar
3. Suemitsu, M., Nishijima, M., and Miyamoto, N., J. Appl. Phys., 69, 7240 (1991).Google Scholar
4. Otoki, Y., Sahara, M., Shinzawa, S., and Kuma, S., Mater. Sci. Forum, 117–118, 405 (1993).Google Scholar
5. Atami, T., Shirata, K., Takahashi, H., Sassa, K., and Tomizawa, K., in GaAs and Related Compound, Karuizawa, edited by Ikegami, T., Hasegawa, F., and Takeda, Y. (Inst. Phys. Conf. Ser., 129), p25.Google Scholar
6. Arai, T., Nozaki, T., Osaka, J., and Tajima, M., in Semi-insulating III-V Materials, Malmo, edited by Grossmann, G. and Ledebo, L. (Adam Hilger, Bristol, 1988), p.201.Google Scholar
7. Okumura, T., Jpn. J. Appl. Phys., 24, L437 (1985).CrossRefGoogle Scholar
8. Shiraki, H., Tokuda, Y., and Sassa, K., in Defect Engineering in Semiconductor Growth, Processing and Device Technology, edited by Ashok, S., Chevallier, J., Sumino, K., and Weber, E. (Mater. Res. Soc. Proc. 262, Pittsburgh, PA, 1992)p.105.Google Scholar
9. Shiraki, H., Tokuda, Y., Sassa, K., and Toyama, N., J. Appl. Phys., to be submitted.Google Scholar
10. Silverberg, P., Omling, P., and Samuelson, L., Appl. Phys. Lett., 52, 1689 (1988).Google Scholar
11. Kimering, L.C., J. Appl. Phys., 45, 1839 (1974).Google Scholar
12. Martin, G.M., Farges, J.P., Jacob, G., and Hallais, J.P., J.Appl.Phys., 51, 2840(1980).Google Scholar
13. Lagowski, J., Lin, D.G., Chen, T.P., Skowronski, M., and Gatos, H.C., Appl. Phys. Lett., 47, 929 (1985).Google Scholar
14. Suemitsu, M., Terada, K., Nishijima, M., and Miyamoto, N., Jpn. J. Appl. Phys., 31, L1654 (1992).CrossRefGoogle Scholar