Results are presented on FIB mixing of an Al0.3Ga0.7As/GaAs superlattice with equal 3.5 nm barrier and well widths. Si++ was accelerated to 100 kV and implanted parallel to sample normal at doses ranging from 1013 to 1015/cm2. The level of inter-layer disordering was measured primarily by Auger depth profiling. The mixing effect of RTA-only increased roughly linearly with annealing time at both 950 and 1000°C, with the latter exhibiting a sharper slope. At either temperature, 90 s was sufficient to produce complete mixing within the accuracy of the measurement. An anneal of 10 s at 950°C, which was utilized in subsequent post-implantation annealing, resulted in ∼ 25% thermally-induced mixing, with a corresponding PL “blue shift” of 6 meV. The level of mixing by an ion dose of 1 × 1014/cm2 yielded a mixing parameter of 0.87, where 1.0 represents complete mixing. This is the lowest ion beam dose necessary for nearly complete mixing reported to date for either FIB or BB implantation. Doubling the dose to 2 × 1014/cm2 results in an increase in mixing by only 0.05 to 0.92. Larger doses produced a diminishing increase in mixing parameter.