Hostname: page-component-77c89778f8-vsgnj Total loading time: 0 Render date: 2024-07-20T10:21:18.879Z Has data issue: false hasContentIssue false
  • English
  • Français

Effect of Deposition Temperature and Post-Heat-Treatment Condition on the Characteristics of (100)-Self-Orientation LaNiO3 Films Prepared by RF Magnetron Sputter Deposition

Published online by Cambridge University Press:  01 February 2011

Kenji Takahashi ,
Muneyasu Suzuki ,
Takahiro Oikawa ,
Haydn Chen  and
Hiroshi Funakubo
Kenji Takahashi
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN
Muneyasu Suzuki
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN
Takahiro Oikawa
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN
Haydn Chen
Affiliation:
Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, HONG KONG
Hiroshi Funakubo
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN PRESTO, Japan Science and Technology Agency (JST), 4–1–8 Honmachi, Kawaguchi, Saitama 332–0012, JAPAN
Get access

Abstract

La-Ni-O films were deposited at deposition temperature ranging from 250 to 540°C by rf magnetron sputter deposition. The effects of deposition temperature and the following heat-treatment condition on the constituent phases and characteristics of LaNiO3 films were investigated. LaNiO3 phase was obtained at the deposition temperature of 250 and 360°C, while La-rich phase of La2NiO4 was appeared above 540°C. Crystalline phases of resultant films after the following heat-treatment strongly depended on the partial pressure of oxygen gas in ambience, i.e., in case of the heat-treatment at 800°C, diffraction peaks originated from LaNiO3 phase disappeared on XRD patterns in pure nitrogen gas ambience, while impurity peaks of NiO appeared in oxygen-excess (>50%) ambience. As a result, LaNiO3 films with high crystallinity and the same lattice parameter as the bulk one were obtained in the deposition at 360°C followed by the heat-treatment at 700°C in air.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 833: Symposium G – Materials, Integration, and Packaging Issues for High-Frequency Devices II , 2004 , G1.9
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Yang, C.-C., Chen, M.-S., Hong, T.-J., Wu, C.-M., Wu, J.-M. and Wu, T.-B., Appl. Phys. Lett. 66, 2643 (1995).Google Scholar
2. Zhai, J. and Chen, H., Appl. Phys. Lett. 83, 798 (2003).Google Scholar
3. Wold, A., Post, B., and Bank, E., J. Am. Chem. Soc. 20, 4911 (1957).Google Scholar
4. Rajeev, K.P., Shivashankar, G.V., and Raychaudhuri, A.K., Solid State Commun. 99, 591 (1991).Google Scholar
5. Lee, H.-Y. and Wu, T.-B., J. Matter. Res. 12, 3165 (1997).Google Scholar
6. Wu, T.-B., Liu, C.-L. and Liu, Y.-W., J. Matter. Res. 17, 1350 (2002).Google Scholar
7. JCPDS 33–0710, Wustenberg, H., Hahn, Inst. fur Kristallogr., Technische Hochschule, Aachen, Germany, ICDD Grant-in-Aid, 1981.Google Scholar