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Effect of Thickness of Ion Beam Deposited Molybdenum Trioxide Thin Films on Gas Sensing Properties

Published online by Cambridge University Press:  01 February 2011

Arun K. Prasad  and
Pelagia I. Gouma
Arun K. Prasad
Affiliation:
Department of Materials Science and Engineering, 314, Old Engineering Building, SUNY-Stony Brook, Stony Brook, NY 11794–2275, U.S.A.
Pelagia I. Gouma
Affiliation:
Department of Materials Science and Engineering, 314, Old Engineering Building, SUNY-Stony Brook, Stony Brook, NY 11794–2275, U.S.A.
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Abstract

This paper documents the study of thickness effects of ion beam deposited molybdenum trioxide thin films on their gas sensing properties. For processing the films, the primary plasma beam source was used to sputter material from the target, while the secondary beam was used as an ion assist source. The deposited material was annealed at 500°C for 8 hours. The microstructural characterization of the films was done using Scanning Electron Microscopy and X-ray diffraction. Sensing tests were performed in the temperature range of 350–500°C under varying and constant concentration levels of ammonia. The recorded data have been qualitatively and quantitatively analyzed and significant trends according to different parameters (thickness, sensing temperature, gas concentration) have been identified. These suggest a relation existing between processing conditions, the microstructure of the material and its response to gases at different concentration, and the optimum working temperature regime.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 828: Symposium A – Semiconductor Materials for Sensing , 2004 , A4.9
Copyright
Copyright © Materials Research Society 2005

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References

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