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Electrical Properties of the Ion-Implanted Pd1−x Bx System

Published online by Cambridge University Press:  15 February 2011

L. Mendoza-Zelis
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P.N°1, F. 91406 Orsay.
A. Traverse
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P.N°1, F. 91406 Orsay.
J. Chaumont
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P.N°1, F. 91406 Orsay.
H. Bernas
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P.N°1, F. 91406 Orsay.
L. Dumoulin
Affiliation:
Laboratoire de Physique des Solides, Université Paris XI, F. 91406 Orsay.
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Abstract

The resistivity (and resistivity temperature dependence) of low temperature B implanted Pd films was measured at B concentrations up to x ֮0.55. Both properties indicate that the evolution of the system towards an amorphous structure sets in at about x ֮0.30 (the deep eutectic composition). The previous discovery of superconductivity by Stritzker and Becker at high values of x is confirmed. Annealing properties of the system were also investigated.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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Footnotes

*

visitor from Universidad de La Plata under a felowship of CONICET (Republica Argentina)

References

REFERENCES

1.Ali, A., Grant, W.A. and Grundy, P.J., Phil. Mag. B 37, 353 (1978)Google Scholar
1aGrant, W.A. and Williams, J.S., Sci. Prog. Oxf. 63, 27 (1976),Google Scholar
1bCullis, A.G., Poate, J.M. and Borders, J.A., Appl. Phys. Letters Vol. 28 No 6, 314 (1976).Google Scholar
2.Bernas, H., Traverse, A., Zawislak, F.C., Chaumont, J. and Dumoulin, L., Jou. de Phys. C 8 N°8 tome 41, 859 (1980). A. Traverse et al., this conference. H. Bernas et al., this conference.Google Scholar
3.Elliot, R.P., Constitution of Binary Alloys, first supplement (McGraw-Hill, New York, 1965) p. 129.Google Scholar
4.Pauling, L., J. Amer. Chem. Soc. 69, 542 (1947).Google Scholar
5.Polk, D.E. and Giessen, B.C. in “Metallic Glasses” ed., Leamy, H.J. and Gilman, J.J. (Amer. Soc. for Metals, Metals Park, Ohio, 1978) p. 1.Google Scholar
6.Stritzker, B. and Becker, J., Phys. Lett. 51A, 147 (1975).Google Scholar
7.Winterbon, K.B., Ion Implantation Range and Energy Deposition Distributions (Plenum, New York 1975).Google Scholar
8.Stobiecki, T. and Hoffmann, H., Jou. de Phys. C8 N°8 tome 41, 485 (1980).Google Scholar
9.Glover, R.E., Phys. Lett. 25A, 542 (1967).Google Scholar
10.Mooij, J.H., Phys. Status Solidi A17, 521 (1973).Google Scholar
11.Stritzker, B. and Wöhl, H., Z. Physik B 24, 367 (1976).Google Scholar