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Electrochemical Dip-Pen Nanolithography of Conductive Wires

Published online by Cambridge University Press:  26 February 2011

Fapei Zhang ,
Ryo Yamada  and
Hirokazu Tada
Fapei Zhang
Affiliation:
fzhang@molectronics.jp, Division of Materials Science, School of Engineering Science, Osaka University, 1-3 machikaneyama, Toyonaka, Osaka, 560-8531, Japan
Ryo Yamada
Affiliation:
yamada@molectronics.jp
Hirokazu Tada
Affiliation:
tada@molectronics.jp
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Abstract

We have explored the fabrication of conductive nanowires on different types of substrates by electrochemistry-assisted DPN (E-DPN) with an atomic force microscope. Various parameters of E-DPN were examined systematically including the effects of coating methods and the types of the tips on the electrodeposition behavior. It was found that a chemically-modified Si AFM tip is very suitable for E-DPN. Platinum and polyaniline nanowires with a line width of ca.100 nm to sub- 100 nm were prepared on the metallic (Au) and semiconducting (Si) surfaces. The parameters indispensable for E-DPN of metal and polymer nanowires on an insulating SiO2 surface will also be discussed.

Keywords

nanostructurescanning probe microscopy (SPM)electrodeposition
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Ra05-09-Rb05-09
Copyright
Copyright © Materials Research Society 2006

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