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Empirical Modeling of Electromigration Early Resistance Changes

Published online by Cambridge University Press:  21 February 2011

J. Niehof ,
H.C. de Graaff  and
J.F. Verwey
J. Niehof
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
H.C. de Graaff
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
J.F. Verwey
Affiliation:
MESA Research Institute, University of Twente, Dept. of Electrical Engineering, group ICE, P.O. Box 217, 7500 AE Enschede, The Netherlands
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Abstract

An empirical model for electromigration-induced early resistance changes is given. The basis olthe model are two coupled partial differential equations, one for vacancies, and one for mobile atoms. These equations are then solved numerically. For model verification purposes model calculations are compared with experimentally obtained resistance change curves.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 309: Symposium M2 – Materials Reliability in Microelectronics III , 1993 , 295
Copyright
Copyright © Materials Research Society 1993

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