Hostname: page-component-68945f75b7-6sdl9 Total loading time: 0 Render date: 2024-09-04T07:19:10.988Z Has data issue: false hasContentIssue false
  • English
  • Français

Evaluation of Multilayers for Soft X-Ray Fabricated by Ion Beam Sputtering.

Published online by Cambridge University Press:  25 February 2011

I. Kataoka ,
I. Yamada ,
K. Eto  and
K. Ito
I. Kataoka
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
I. Yamada
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
K. Eto
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
K. Ito
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
Get access

Abstract

Multilayer structures of Li20 and Ni were deposited onto polished fused quartz by the dual ion beam sputtering method. Optical and physical properties of the multilayer structure were evaluated. Reflectivity of multilayer mirrors at an incident angle of 79.6 deg. was 17% for 44Å(C-K line). There was good agreement with the calculated value considering the interface roughness and residual oxygen contamination in the Ni layer from the background of Li2O deposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 513
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. B.Niemann et al., Nucl. Inst. Meth. A246,675(1986).10.1016/0168-9002(86)90172-5CrossRefGoogle Scholar
2. Etoh, K., Kataoka, I. and Ito, K., presented at The International Congress on Optical Science and Engineering, Hamburg, FRG, 1988(to be published)Google Scholar
3. Henke, B.L., AIP Proc. 75,340(1981)10.1063/1.33141CrossRefGoogle Scholar
4. Barnes, S.E., Gridrod, D.C., Jolly, T.W. and Shaw, C.J., Proceedings of 6th International Conference of Ion & Plasma Assisted Techniques, Brighton, UK, 1987, p. 441 Google Scholar
5. Beckmann, P. and Spizzichino, A., The Scattering of E.M. Waves from Rough Surfaces, (Pergamon, New York, 1963)Google Scholar