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Evolution of the Properties of Reactively Sputtered Zirconium Nitrides on Silicon Substrates

Published online by Cambridge University Press:  15 February 2011

Pierre Vanden Brande ,
Stephane Lucas ,
Rene Winand ,
Lucien Renard  and
Alain Weymeersch
Pierre Vanden Brande
Affiliation:
Université Libre de Bruxettes, Department of Metallurgy-Electrochemistry, CP165, 50 avenue Roosevelt, B1050 Brussels (BELGIUM).
Stephane Lucas
Affiliation:
The authors thank La Region Wallonne, Belgium, for partial financial support, Le Laboratoire d’Analyses par reactions Nucléaires des Facultés Universitaires Notre Dame de la Paix à Namur, Belgium, for its support in the NRA experiments.
Rene Winand
Affiliation:
The authors thank La Region Wallonne, Belgium, for partial financial support, Le Laboratoire d’Analyses par reactions Nucléaires des Facultés Universitaires Notre Dame de la Paix à Namur, Belgium, for its support in the NRA experiments.
Lucien Renard
Affiliation:
Centre de Recherches et Développements du Groupe Cockerill-Sambre, Campus Universitaire du Sort Tilman, Bd. de Colonster B57, 4000 Liège (BELGIUM).
Alain Weymeersch
Affiliation:
The authors thank La Region Wallonne, Belgium, for partial financial support, Le Laboratoire d’Analyses par reactions Nucléaires des Facultés Universitaires Notre Dame de la Paix à Namur, Belgium, for its support in the NRA experiments.
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Abstract

Zirconium nitride films on silicon substrates have been prepared by DC magnetron enhanced reactive sputtering in a N2/Ar gas mixture under various experimental conditions. The films properties (chemical composition, structure, morphology and optical response) were investigated and related to the experimental conditions. It is shown that these properties are strongly related to the target current density which governs the deposition rate, to the deposit thickness, to the nitrogen partial pressure and to the residual gas contamination. The objective of this paper is to detect the minimum film thickness threshold under which a zirconium nitride coating cannot be used in decorative applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 759
Copyright
Copyright © Materials Research Society 1994

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References

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