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Fast High-Density Low-Pressure Plasma Synthesis of GaN Nanocrystals

Published online by Cambridge University Press:  01 February 2011

Rebecca Joy Anthony
Affiliation:
ranthony@me.umn.edu, University of Minnesota, Mechanical Engineering
Elijah Thimsen
Affiliation:
elijah.thimsen@wustl.edu, University of Minnesota, Mechanical Engineering
Joe Johnson
Affiliation:
joh01714@umn.edu, University of Minnesota, Electrical and Computer Engineering
Stephen A Campbell
Affiliation:
campbell@ece.umn.edu, University of Minnesota, Electrical and Computer Engineering
Uwe Kortshagen
Affiliation:
uk@me.umn.edu, University of Minnesota, Mechanical Engineering, United States
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Abstract

Gallium Nitride is of interest due to its direct bandgap, which allows for efficient emission in the near-UV range. Bulk GaN is already in use in solid-state devices that exploit its emissive properties, however, the promise of GaN nanocrystals as tunable emitters for use in light-emitting devices and lasers has led to the recent exploration of nanocrystalline GaN synthesis routes. Here we discuss the use of nonthermal plasmas for the synthesis of nanocrystalline pow-ders of GaN. The particles were examined using transmission electron microscopy and x-ray photoelectron spectroscopy.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1. Garcia, R., Thomas, A., Bell, A., Stevens, M., and Ponce, F. A., Mat. Res. Soc. Proc., 798, Y10.75.1 (2003)CrossRefGoogle Scholar
2. Goodwin, T.J., Leppert, V., Risbud, S.H., Kennedy, I. M., and Howard, H. W. H. L., Appl. Phys. Lett., 70, 3122 (1997).CrossRefGoogle Scholar
3. Coe, S., Woo, W.-K., Bawendi, M. and Bulovic, V., Nature, 420: p. 800 (2002).CrossRefGoogle Scholar
4. Gur, I., Frommer, N. A., Geier, M. L., and Alivisatos, A. P., Science, 310, 462 (2005).CrossRefGoogle Scholar
5. Azuma, Y., Shimada, M., and Okuyama, K.., Chemical Vapor Deposition 10, 1113 (2004).CrossRefGoogle Scholar
6. Honda, T., Akiyama, M., Egawa, S., Aoki, Y., Obinata, N., and Kawanishi, H., Phys. Stat. Sol. (a) 201, 28142817, (2004).CrossRefGoogle Scholar
7. Mangolini, L., Thimsen, E., and Kortshagen, U., Nano Letters, 5, 655659, (2005).CrossRefGoogle Scholar
8. Bapat, A., Perrey, C., Campbell, S. A., Carter, C. B., and Kortshagen, U., J. Appl. Phys. 94, 19691974 (2003).CrossRefGoogle Scholar