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Fluid Mechanics Model and Analysis for the Photofabrication of Surface Relief Grating on Azo Polymers

Published online by Cambridge University Press:  21 March 2011

Takashi Fukuda ,
Hiro Matsuda ,
Kimio Sumaru  and
Tadae Yamanaka
Takashi Fukuda
Affiliation:
Dept. of Polymer Engineering National Institute of Materials and Chemical Research (NIMC), 1-1 Higashi, Tsukuba, Ibaraki 305-8565 Japan
Hiro Matsuda
Affiliation:
Dept. of Polymer Engineering National Institute of Materials and Chemical Research (NIMC), 1-1 Higashi, Tsukuba, Ibaraki 305-8565 Japan
Kimio Sumaru
Affiliation:
Dept. of Polymer Chemistry, National Institute of Materials and Chemical Research (NIMC), 1-1 Higashi, Tsukuba, Ibaraki 305-8565 Japan
Tadae Yamanaka
Affiliation:
Dept. of Polymer Chemistry, National Institute of Materials and Chemical Research (NIMC), 1-1 Higashi, Tsukuba, Ibaraki 305-8565 Japan
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Abstract

The mass transporting properties of the surface relief grating (SRG) photofabrication on azobenzene polymer films is discussed precisely using an existing fluid mechanics model. Formulation for the SRG inscription rate is derived analytically from Navier-Stokes equation. In consequence, the dependence of inscription rate of the SRG on the experimental and geometrical parameters was explained very well by the model. The photoinduced surface deformation with an onedimensional Gaussian laser beam was also carried out in order to establish the validity and the generality of our fluid mechanics model. The experimentally obtained surface deformation profile is well reproduced by the theoretical model generalized for arbitrary force field profile.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 598: Symposium BB – Electrical, Optical, & Magenetic Properties...V , 1999 , BB3.23
Copyright
Copyright © Materials Research Society 1999

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References

1. Rochon, P., Batalla, E. and Nathansohn, A., Appl. Phys. Lett., 66, 136 (1995).Google Scholar
2. Kim, D.Y., Li, L., Kumar, J. and Tripathy, S., Appl. Phys. Lett., 66, 1166 (1995).Google Scholar
3. Kim, D.Y., Li, L., Jiang, X.L., Shivshankar, V., Kumar, J. and Tripathy, S.K., Macromolecules, 28, 8835 (1995).Google Scholar
4. Viswanathan, N.K., Kim, D.Y., Bian, S., Williams, J., Liu, W., Li, L., Samuelson, L., Kumar, J. and Tripathy, S.K., J. Mater. Chem., 9, 1941 (1999).Google Scholar
5. Fukuda, T., Matsuda, H., Viswanathan, N.K., Tripathy, S., Kumar, J., Shiraga, T., Kato, M. and Nakanishi, H., Synth. Met., 102, 1435 (1999).Google Scholar
6. Fukuda, T., Matsuda, H., Shiraga, T., Kimura, T., Kato, M., Viswanathan, N.K., J. Kumar and Tripathy, S.K., submitted to Macromolecules.Google Scholar
7. Collier, R.J., Burckhardt, C.B. and Lin, L.H., Optical Holography, (Academic Press, New York, 1971)Google Scholar
8. Nishihara, H., Haruna, M. and Suhara, T., Optical Integrated Circuits, (McGraw-Hill, New York, 1989)Google Scholar
9. Kumar, J., Li, L., Jiang, X.L., Kim, D.Y., Lee, T.S. and Tripathy, S.K., Appl. Phys. Lett., 72, 2096 (1998).Google Scholar
10. Barrett, C.J., Rochon, P.L. and Natansohn, A.L., J. Chem. Phys., 109, 1505 (1998).Google Scholar
11. Pedersen, T.G., Johansen, P.M., Holme, N.C.R., Ramanujam, P.S. and Hvilsted, S., Phys. Rev. Lett., 80, 89 (1998).Google Scholar
12. Sumaru, K., Yamanaka, T., Fukuda, T. and Matsuda, H., Appl. Phys. Lett., 75, 1878 (1999).Google Scholar
13. Fukuda, T., Sumaru, K., Yamanaka, T. and Matsuda, H., accepted to Mol. Cryst. Liq. Cryst.Google Scholar
14. Bian, S., Williams, J.M., Kim, D.Y., Li, L., Balasubramanian, S., Kumar, J. and Tripathy, S., J. Appl. Phys., 86, 4498 (1999).Google Scholar