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High-Quality GaN Grown by Molecular Beam Epitaxy on Ge(001)

Published online by Cambridge University Press:  10 February 2011

H. Siegle
Affiliation:
Department of Materials Science and Mineral Engineering, UC Berkeley, Berkeley, CA 94720 Lawrence Berkeley National Laboratory, Materials Science Division, Berkeley, CA 94720
Y. Kim
Affiliation:
Department of Materials Science and Mineral Engineering, UC Berkeley, Berkeley, CA 94720 Lawrence Berkeley National Laboratory, Materials Science Division, Berkeley, CA 94720
G. S. Sudhir
Affiliation:
Department of Materials Science and Mineral Engineering, UC Berkeley, Berkeley, CA 94720 Lawrence Berkeley National Laboratory, Materials Science Division, Berkeley, CA 94720
J. Kruger
Affiliation:
Department of Materials Science and Mineral Engineering, UC Berkeley, Berkeley, CA 94720 Lawrence Berkeley National Laboratory, Materials Science Division, Berkeley, CA 94720
P. Perlin
Affiliation:
Lawrence Berkeley National Laboratory, Materials Science Division, Berkeley, CA 94720
J. W. Ager
Affiliation:
Lawrence Berkeley National Laboratory, Materials Science Division, Berkeley, CA 94720
C. Kislelowski
Affiliation:
Lawrence Berkeley National Laboratory, National Center for Electron Microscopy, Berkeley, California 94720
E. R. Weber
Affiliation:
Department of Materials Science and Mineral Engineering, UC Berkeley, Berkeley, CA 94720
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Abstract

We report on growth of GaN on Germanium as an alternative substrate material. The GaN films were deposited on Ge(001) substrates by plasma-assisted molecular beam epitaxy. Atomic force microscopy, x-ray diffraction, photoluminescence, and Raman spectroscopy were used to characterize the structural and optical properties of the films. We observed that the Ga/N ratio plays a crucial role in determining the phase purity and crystal quality. Under N-rich conditions the films were phase-mixed, containing cubic and hexagonal GaN, while in the Ga-rich regime they were purily hexagonal. The latter samples show bandedge luminescence with linewidths as small as 31 meV at low temperatures.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

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