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Hyperthermal CI Atom Beam Produced by Laser Vaporization of Cryogenic ICI Films

Published online by Cambridge University Press:  01 January 1992

Gabriela C. Weaver ,
Francis X. Campos  and
Stephen R. Leone
Gabriela C. Weaver
Affiliation:
Joint Institute for Laboratory Astrophysics, National Institute of Standards and Technology and University of Colorado, and Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado, 80309–0440
Francis X. Campos
Affiliation:
Joint Institute for Laboratory Astrophysics, National Institute of Standards and Technology and University of Colorado, and Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado, 80309–0440
Stephen R. Leone*
Affiliation:
Joint Institute for Laboratory Astrophysics, National Institute of Standards and Technology and University of Colorado, and Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado, 80309–0440
*
*Staff member, Quantum Physics Division, National Institute of Standards and Technology
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Abstract

A source of energetic, neutral Cl atoms is produced by laser vaporization of cryogenic ICI films using either the 532 nm or 266 nm output of a pulsed Nd:YAG laser. The pulsed Cl mean kinetic energy can be tuned from 0.4 eV to 3.4 eV by varying the laser repetition rate or the rate of deposition of the ICl film. Also present in the beam are ICI, I, I2, and Cl2 The heavier species all have lower velocities than the Cl atoms, and this difference in velocities can be accentuated by vaporizing thinner films. Using a mechanical velocity chopper, the fastest part of the beam can be selected, which consists of > 90% Cl atoms. Results suggest that the vaporization process involves a directed mass flow in which the heavier molecules are propelled to higher velocities by the faster Cl atom flux. The atom source may be used for selective etching studies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 249
Copyright
Copyright © Materials Research Society 1993

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References

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