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In situ and Ex situ Applications of Spectroscopic Ellipsometry
Published online by Cambridge University Press: 22 February 2011
Abstract
We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.
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- Research Article
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- Copyright © Materials Research Society 1994
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