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In Situ Deformation Studies of Fe/Al and Fe/Si Multi-Layered Films Prepared by Ion Beam Sputtering

Published online by Cambridge University Press:  22 February 2011

K. Kubota
Affiliation:
Dept. of Physical Electronics, Tokyo Institute of Technology, 2–12–1 O-okayama, Meguro-ku, Tokyo 152, Japan.
M. Naoe
Affiliation:
Dept. of Physical Electronics, Tokyo Institute of Technology, 2–12–1 O-okayama, Meguro-ku, Tokyo 152, Japan.
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Abstract

In situ deformation measurements of Fe/Al and Fe/Si multi-layered films on thin substrates were made by detecting the curvature of substrates during deposition. The deformation inside of Fe layers corresponding to the compressive and tensile stresses was detected for the Fe/Al and Fe/Si multi-layered films, respectively. For the Fe/Si multi-layered films, the internal stress in Fe layers became from tensile to compressive during deposition under bombardment of Ar Jons. These stresses in Fe layer were closely related to the soft magnetic properties of these multi-layered films. In situ deformation studies may be useful to make sure the effect of internal stress on the magnetic properties of these multi-layered films.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

[1] Nagakubo, M., Yamamoto, T., and Naoe, M.; J. Appl. Phys. 64 (10), 5751 (1988).CrossRefGoogle Scholar
[2] Hoffman, R.W.; Physics of Thin Films 3 (1966) 211 (Academic Press, Ed. Hass, G. and Then, R.E.).Google Scholar