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In Situ Plasma Analysis, Fluorine Incorporation, Thermostability, Stress, and Hardness Comparison of Fluorinated Amorphous Carbon and Hydrogenated Amorphous Carbon Thin Films Deposited on Si by Plasma Enhanced Chemical Vapor Deposition

Published online by Cambridge University Press:  10 February 2011

A. D. Glew ,
M. A. Cappelli ,
M. N. Touzelbaev  and
Y. Hu
A. D. Glew
Affiliation:
Dept. of Materials Science and Engineering, Stanford University
M. A. Cappelli
Affiliation:
Dept. of Mechanical Engineering, Stanford University
M. N. Touzelbaev
Affiliation:
Dept. of Mechanical Engineering, Stanford University
Y. Hu
Affiliation:
Steag RTP Systems Inc., San Jose, CA
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Abstract

In situ observation of the plasma properties during deposition of fluorinated amorphous hydrogenated carbon (FLAC) and unfluorinated amorphous hydrogenated carbon are performed. The relationship between film properties and impinging ion energy and incident ion momentum is discussed within the framework of existing models of diamond-like carbon (DLC) formation. The DLC films are deposited in a low pressure radio frequency discharge operating at 13.57 MHz with methane and carbon tetra-fluoride as the source gases. Thermostability, stress, and mechanical properties are investigated. The films are elevated to 400 degrees C in order to investigate thermostability. Thin film stress and nano-hardness are also studied. The film density is investigated by gravimetric methods. The fluorinated film stoichiometry is explored with x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 565: Symposium O – Low-Dielectric Constant Materials V , 1999 , 285
Copyright
Copyright © Materials Research Society 1999

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