Hostname: page-component-84b7d79bbc-2l2gl Total loading time: 0 Render date: 2024-07-27T22:40:50.977Z Has data issue: false hasContentIssue false
  • English
  • Français

Influence of Substrate Temperature and Hydrogen Dilution Ratio on the Properties of Nanocrystalline Silicon Thin Films Grown by Hot-Wire Chemical Vapor Deposition

Published online by Cambridge University Press:  01 February 2011

H.R. Moutinho ,
C.-S. Jiang ,
B. Nelson ,
Y. Xu ,
J. Perkins ,
B. To ,
K.M. Jones ,
M.J. Romero  and
M.M. Al-Jassim
H.R. Moutinho
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
C.-S. Jiang
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
B. Nelson
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
Y. Xu
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
J. Perkins
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
B. To
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
K.M. Jones
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
M.J. Romero
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
M.M. Al-Jassim
Affiliation:
National Renewable Energy Laboratory1617 Cole Blvd. Golden CO 80401, USA
Get access

Abstract

We have studied the influence of substrate temperature and hydrogen dilution ratio on the properties of silicon thin films deposited on single-crystal silicon and glass substrates. We varied the initial substrate temperature from 200° to 400°C and the dilution ratio from 10 to 100. We also studied the effectiveness of the use of a seed layer to increase the crystallinity of the films. The films were analyzed by atomic force microscopy, X-ray diffraction, Raman spectroscopy, and transmission and scanning electron microscopy. We found that as the dilution ratio is increased, the films go from amorphous, to a mixture of amorphous and crystalline, to nanocrystalline. The effect of substrate temperature is to increase the amount of crystallinity in the film for a given dilution ratio. We found that the use of a seed layer has limited effects and is important only for low values of dilution ratio and substrate temperature, when the films have large amounts of the amorphous phase.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 762: Symposium A – Amorphous and Nanocrystalline Silicon-Based Films – 2003 , 2003 , A5.4
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Kleider, J.P., Longeaud, C., Bruggemann, R., and Houze, F., Thin Solid Films 383, 57 (2001).Google Scholar
2. Puigdollers, J., Cifre, J., Polo, M.C., Asensi, J.M., Tertomeu, J., Andreu, J., and Lloret, A., Appl. Surf. Sci. 86, 600 (1995).Google Scholar
3. Saha, S.C., Rath, J.K., Kshirsagar, S.T., and Ray, S., J. Phys. D: Appl. Phys. 30, 2686 (1997).Google Scholar
4. Hamakawa, Y. and Takakura, H., Proc. Twenty-Eighth IEEE Photov. Spec. Conf., 766 (Anchorage, 2000).Google Scholar
5. Konagai, M., Tsushima, T., Ide, Y., Asakusa, K., Jujisaki, T., Kim, M.K., Wakita, Y., and Yamada, A., Proc. Twenty-Eighth IEEE Photov. Spec. Conf., 788 (Anchorage, 2000).Google Scholar
6. Moutinho, H.R., Jiang, C.-S., Perkins, J., Xu, Y., Nelson, B.P., Jones, K.M., Romero, M.J., and Al-Jassim, M.M., Thin Solid Films (2003) (in press).Google Scholar
7. Zhou, J.-H., Ikuta, K., Yasuda, T., Umeda, T., Yamasaki, S., and Tanaka, K., Appl. Phys. Lett. 71, 1534 (1997).Google Scholar
8. Moutinho, H.R., Romero, M.J., Jiang, C.-S., Xu, Y., Nelson, B.P., Jones, K.M., Mahan, A.H., and Al-Jassim, M.M., Proc. Twenty-Ninth IEEE Photov. Spec. Conf. (New Orleans, 2002) (in press).Google Scholar