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The Initial Stages of Metal Deposition on Metal and Semiconductor Electrodes Studied by In Situ Stm

Published online by Cambridge University Press:  10 February 2011

D. M. Kolb ,
R. J. Randler ,
R. I. Wielgosz  and
J. C. Ziegler
D. M. Kolb
Affiliation:
Dept. of Electrochemistry, University of Ulm, 89069 Ulm, Germany
R. J. Randler
Affiliation:
Dept. of Electrochemistry, University of Ulm, 89069 Ulm, Germany
R. I. Wielgosz
Affiliation:
Dept. of Electrochemistry, University of Ulm, 89069 Ulm, Germany
J. C. Ziegler
Affiliation:
Dept. of Electrochemistry, University of Ulm, 89069 Ulm, Germany
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Abstract

The deposition of Cu onto Au(100) and of Pb onto n- Si(111) electrodes from aqueous solutions has been monitored in situ by scanning tunneling microscopy. In the first case, a bcc structure of the Cu overlayer is observed, which allows pseudomorphic growth on Au(100) up to the 10th layer. Then a slow structural transition to fee begins. In contrast, Pb on Si(111) is shown to deposit as 3D crystallites with flat (111) terminated surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 451: Symposium P – Electrochemical Synthesis and Modification , 1996 , 19
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Kolb, D.M., Schering Lectures Publication Vol. 2. (Schering Research Foundation, Berlin (1991) Pl Google Scholar
2. Budevski, E., Staikov, G. and Lorenz, W.J., Electrochemical Phase Formation and Growth. (VCH, Weinheim, 1996)Google Scholar
3. Toney, M.F., Howard, J.N., Richer, J., Borges, G.L., Gordon, J.G., Melroy, O.R., Yee, D. and Sorensen, L.B., Phys. Rev. Lett., 75 (1995) 4472 Google Scholar
4. Batina, N., Will, T. and Kolb, D.M., Faraday Discuss., 94 (1992) 93 Google Scholar
5. Obretenov, W., Schmidt, U., Lorenz, W.J., Staikov, G., Budevski, E., Carnal, D., Müller, U., Siegenthaler, H. and Schmidt, E., J. Electrochem. Soc, 140 (1993) 692 Google Scholar
6. Will, T., Dietterle, M. and Kolb, D.M., in Nanoscale Probes of the Solid/Liquid Interface Vol. E 288, edited by Gewirth, A.A. and Siegenthaler, H. (NATO-ASI, Kluwer, Dordrecht, 1995), p. 137 Google Scholar
7. Reineke, R. and Memming, R., Surf. Sci., 192 (1987) 66 Google Scholar
8. Allongue, P. and Souteyrand, E., J. Vac. Sci. Technol. B5 (1987) 1644 Google Scholar
9. Heller, A., Aspnes, D.E., Porter, J.D., Sheng, T.T. and Vadimsky, R.G., J. Phys. Chem., 89 (1985)4444 Google Scholar
10. Szklarczyk, M. and Bockris, J.O.'M., J. Am. Chem. Soc, 88 (1984) 1808 Google Scholar
11. Kobayashi, T., Tanigushi, Y., Yoneyama, M. and Tamura, H., J. Phys. Chem., 87 (1983) 768 Google Scholar
12. Kühne, M.M. and Schefold, J., Ber. Bunsenges. Phys. Chem., 92 (1988) 1430 Google Scholar
13. Allongue, P., Souteyrand, E. and Allemand, L., J. Electrochem. Soc, 136 (1989) 1027 Google Scholar
14. Allongue, P. and Souteyrand, E., J. Electroanal. Chem., 286 (1990) 217 Google Scholar
15. Allongue, P. and Souteyrand, E., J. Electroanal. Chem., 362 (1993) 79 Google Scholar
16. Allongue, P., Souteyrand, E. and Allemand, L., J. Electroanal. Chem., 362 (1993) 89 Google Scholar
17. Bindra, P., Gerischer, H. and Kolb, D.M., J. Electrochem. Soc, 124 (1977) 1012 Google Scholar
18. Burrows, V.A., Chabal, Y.J., Higashi, G.S., Raghavachari, K. and Christman, S.B., Appl. Phys. Lett., 53 (1988) 998 Google Scholar
19. Chabal, Y.J., Higashi, G.S., Raghavachari, K. and Burrows, V.A., J. Vac. Sci. Technol. A7 (1989) 2104 Google Scholar
20. Higashi, G.S., Chabal, Y.J., Trucks, G.W. and Raghavachari, K., Appl. Phys. Lett., 56 (1990) 656 Google Scholar
21. Higashi, G.S., Becker, R.S., Chabal, Y.J. and Becker, A.J., Appl. Phys. Lett., 58 (1991) 1656 Google Scholar
22. Hessel, H.E., Feltz, A., Reiter, M., Memmert, U. and Behm, R.J., Chem. Phys. Lett., 186 (1991) 275 Google Scholar
23. Kern, W. and Puotinen, D.A., RCA Review, 31 (1970) 187 Google Scholar
24. Kolb, D.M., in Advances in Electrochemistry and Electrochem. Engineering Vol. 11, edited by Genscher, H. and Tobias, Ch.W. (Wiley, New York, 1978), p. 125 Google Scholar
25. Dietterle, M., Will, T. and Kolb, D.M., Surf. Sci., 342 (1995) 29 Google Scholar
26. Dietterle, M., Will, T. and Kolb, D.M., in preparationGoogle Scholar
27. Chelikowsky, J.R. and Chou, M.Y., Phys. Rev. B, 38 (1988) 7966 Google Scholar
28. Magnussen, O.M., Hotlos, J., Behm, R.J., Batina, N. and Kolb, D.M., Surf. Sci., 296 (1993) 310 Google Scholar
29. Dakkouri, A.S., Sol. State Ion., in pressGoogle Scholar
30. Allongue, P., in Advances in Electrochemical Science and Engineering Vol. 4, edited by Gerischer, H. and Tobias, C.W. (VCH Publishers Inc., New York, 1995) pp. 1–66 Google Scholar
31. Tornita, E., Matsuda, N. and Itaya, K., J. Vac. Sci. Technol. A8 (1990) 534 Google Scholar
32. Pietsch, G.J., Köhler, U. and Henzler, M., J. Appl. Phys., 73 (1993) 4797 Google Scholar
33. Chazalviel, J.-N., Surf. Sci., 88 (1979) 204 Google Scholar
34. Schlichthörl, G. and Peter, L.M., J. Electrochem. Soc., 141 (1994) L171 Google Scholar
35. Chazalviel, J.-N., in Porous Silicon Science and Technology, edited by Vial, J.-C. and Derien, J. (Springer-Verlag, Berlin, 1995) pp. 17–32; and references thereinGoogle Scholar
36. Stimming, U., Vogel, R., Kolb, D.M. and Will, T., Power, J. Sources, 43 (1993) 169 Google Scholar