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Laser Growth of Thin Silicon Crystals in Patterned Structures
Published online by Cambridge University Press: 15 February 2011
Abstract
Beam processing can be applied to thin, polycrystalline silicon films on amorphous substrates to: a( increase grain size, b( produce single, isolated crystals, and c( to produce oriented single crystals. Specific methods for these tasks are outlined. Crystal growth and heat flow consideration appropriate to each are presented.
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- Research Article
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- Copyright © Materials Research Society 1981