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Low Energy Ion Beam Modification of High Performance Polymer

Published online by Cambridge University Press:  25 February 2011

Hyo-Soo Jeong  and
R. C. White
Hyo-Soo Jeong
Affiliation:
Department of Electrical Engineering and Microelectronics Sciences LaboratoriesColumbia University, New York, N.Y., 10027
R. C. White
Affiliation:
Department of Electrical Engineering and Microelectronics Sciences LaboratoriesColumbia University, New York, N.Y., 10027
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Abstract

Ion beam modification of polyimide (PI) by low energy and surface analysis were performed using XPS. The surface chemistry was monitored as a function of ion dose. The results indicate that even low energy ion beam (LEIB) induces a drastic change in chemical compositions on the PI surface, and the modification begins to occur at the onset of beam treatment, contrary to previous observations. Damage level is severely restricted to surface region. It is also proven that LEIB modification is a direct way to control interface chemistry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 325
Copyright
Copyright © Materials Research Society 1992

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References

1. Baglin, J.E.E., in Fundamentals of Adhesion, edited by Lee, L.H. (Plenum, New York, 1991) P.363 Google Scholar
2. Tombrello, T.A., Mat. Res. Soc. Symp. Proc. 25, 173 (1984)Google Scholar
3. Baglin, J.E.E., Nucl. Instr. and Meth. B39, 764 (1989)Google Scholar
4. Jeong, H.S. and White, R.C., J. Electron Spectrosc. Relat. Phenom., 52,447 (1990)CrossRefGoogle Scholar
5. Jeong, H.S. and White, R.C., to be published in J. Vac. Sci. Technol. (1992)Google Scholar
6. Colligon, J.S. and Kheyrandish, H., Vacuum, 39, 705 (1989)Google Scholar
7. White, R.C., Haight, R., Silverman, B.D. and Ho, P.S., J. Vac. Sci. Technol. A6, 2188 (1988)Google Scholar
8. Bachman, B.J. and Vasile, M.J., J. Vac. Sci. Technol. A7(4), 2709 (1989)Google Scholar
9. Jeong, H.S. and White, R.C., Nucl. Instr. and Meth. B59/60, 1285 (1991), and references thereinGoogle Scholar