Hostname: page-component-7479d7b7d-767nl Total loading time: 0 Render date: 2024-07-11T12:18:54.180Z Has data issue: false hasContentIssue false
  • English
  • Français

Low Temperature Deposition of Diamond Thin Films Using Electron Cyclotron Resonance Plasmas

Published online by Cambridge University Press:  21 February 2011

Donald R. Gilbert  and
Rajiv K. Singh
Donald R. Gilbert
Affiliation:
University of Florida, Department of Materials Science and Engineering, Gainesville, FL 32611
Rajiv K. Singh
Affiliation:
University of Florida, Department of Materials Science and Engineering, Gainesville, FL 32611
Get access

Abstract

We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550 - 750 °C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 388: Symposium Q – Film Synthesis and Growth Using Energetic Beams , 1995 , 329
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Bachmann, P., Leers, D., and Lydtin, H., Diamond and Related Materials 1, 1 (1991).Google Scholar
2 Nunotani, M., Komori, M., Yamasawa, M., Fujiwara, Y., Sakuta, K., Kobayashi, T., S, Nakashima, Minomo, S., Taniguchi, M., and M.Sugiyo, , Jpn. J. appl. Phys. 30, L1199 (1991)Google Scholar
3 Harris, S. and Weiner, A., Diamond, Silicon Carbide and Related Wide Bandgap Semiconductors, Glass, J., Messier, R., and Fujimori, N. (eds.), MRS Symposia Proceedings 162, Materials Research Society, Pittsburgh, PA, 103 (1990).Google Scholar
4 Chang, J., Mantei, T., Vuppuladhadium, R., and Jackson, H., J. appl. Phys. 71, 2918 (1992)Google Scholar
5 Liou, Y., Inspektor, A., Weimer, R., Knight, D., and Messier, R., J. Mater. Res. 50, 2305 (1990).Google Scholar
6 Sanchez, O., Gomez-Aleixandre, C., Agullo, F., and Albella, J., Diamond and Related Materials 3, 1183 (1994).Google Scholar
7 Pehrsson, P., Celii, F., and Butler, J., in Diamond Films and Coatings, Davis, R. (ed.), Noye; Publications, Park Ridge, NJ, 92 (1993). 334 Google Scholar