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Low Temperature MoCVD Routes to Thin Films from Transition Metal Precursors

Published online by Cambridge University Press:  21 February 2011

Gregory S. Girolami  and
John E. Gozum
Gregory S. Girolami
Affiliation:
School of Chemical Sciences and Materials Research Laboratory, The University of Illinois at Urbana-Champaign, Urbana, IL 61801
John E. Gozum
Affiliation:
School of Chemical Sciences and Materials Research Laboratory, The University of Illinois at Urbana-Champaign, Urbana, IL 61801
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Abstract

A review is presented of early and recent advances in the metal-organic chemical vapor deposition (MOCVD) of thin films from organotransition metal and related precursors. Routes to pure metals and alloys, metal carbides, metal borides, metal nitrides, metal silicides, and related materials will be summarized. Also included is a discussion of both the advantages and disadvantages of employing metal-organic precursors that contain transition elements.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 319
Copyright
Copyright © Materials Research Society 1990

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