Hostname: page-component-5c6d5d7d68-lvtdw Total loading time: 0 Render date: 2024-08-17T03:21:16.943Z Has data issue: false hasContentIssue false

Luminescence Activation of Porous Silicon by Post-Anodization Treatment

Published online by Cambridge University Press:  28 February 2011

A. Kux
Affiliation:
Physik-Department E16, Tech. Univ. München, 8046 Garching, Germany
F. Muller
Affiliation:
Physik-Department E16, Tech. Univ. München, 8046 Garching, Germany
F. Koch
Affiliation:
Physik-Department E16, Tech. Univ. München, 8046 Garching, Germany
Get access

Abstract

We prepare “nonluminescing” porous Si by electrochemical etching (50 mA/cm2 in 50% HF diluted 1:1 with ethanol) of 1 Ω(100) p-type wafers in the absence of light in order to study the subsequent luminescence activation by postprocessing. The treatments are: photochemical etching, ageing under ambient conditions, thermal oxidation. The study reveals remarkable inhomogeneities in the depth distribution of the luminescence and allows us to comment on the relative importance of particle size, spin density and chemical composition for the luminescence.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Asano, T., Higa, K., Aoki, S., Tonouchi, M., and Miyasato, T., Jpn. J. Appl. Phys. 31, L373 (1992)Google Scholar
2. Canham, L.T., Appl. Phys. Lett. 57, 1046 (1990)Google Scholar
3. Prokes, S.M., Freitas, J.A. Jr, and Searson, P.C., Appl. Phys. Lett. 60, 3295 (1992)Google Scholar
4. Tischler, M.A., Collins, R.T., Tsang, J.C., Stathis, J.H., Batstone, J.L., and Zollner, S. in Light Emission from Porous Silicon, edited by Iyer, S.S., Collins, R.T., and Canham, L.T. (Mater. Res. Soc. Proc. 256, Pittsburgh PA, 1992) pp. 189195 Google Scholar
5. Petrova-Koch, V., Muschik, T., Kux, A., Meyer, B.K., Koch, F., and Lehmann, V., Appl. Phys. Lett. 61, 943 (1992)Google Scholar