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the Microstructure and Electrical Resistivity of Cluster-Based thin Films

Published online by Cambridge University Press:  15 February 2011

Jeffery D. Bielefeld  and
Ronald P. Andres
Jeffery D. Bielefeld
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
Ronald P. Andres
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
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Abstract

Cluster-assembled thin metal films exhibit properties which are different from those of films obtained by conventional atomic-deposition. We present TEM data on the evolution of 2-D Microstructure and SFM data on the evolution of 3-D Microstructure in thin films grown by vacuum deposition of preformed silver clusters and of preformed acetylene-silver clusters on flat SiO2, and Mica. Electrical resistivity measurements of cluster-based Ag and Ag/C2H2 films deposited on glass substrates with nominal film thicknesses of 5 nm - 50 nm are also presented and discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 317: Symposium B – Mechanisms of Thin Film Evolution , 1993 , 155
Copyright
Copyright © Materials Research Society 1994

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References

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