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Microstructure and Optical Properties of Co Sputter Deposited Si-Al Nanocomposite Thin Films

Published online by Cambridge University Press:  17 March 2011

F. Niu ,
P.J. Dobson  and
B. Cantor
F. Niu
Affiliation:
Department of Materials Science and Engineering and Materials Research Center, Northwestern University, Evanston, Illinois 60208, USA.
P.J. Dobson
Affiliation:
Oxford Centre for Advanced Materials and Composites, University of Oxford, Oxford, OX1 3PH, UK.
B. Cantor
Affiliation:
Oxford Centre for Advanced Materials and Composites, University of Oxford, Oxford, OX1 3PH, UK.
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Abstract

Novel Si-Al nanocomposite thin films were made by radio frequency co-sputtering of Si and Al with Al content from 0 at.% to 69 at.%. Microstructure and optical properties of the films were characterised by conventional and high resolution transmission electron microscopyand spectrometry in the wavelength range from 200 to 3000 nm. The film microstructure consisted of Al nanoparticles (2-9 nm) embedded in an amorphous Si-Al matrix. Optical absorption spectra of the films up to 50 at.% Al exhibited a sharp absorption peak below500 nm and relatively low absorption above 500 nm. In addition, the absorption peak shifted towards longer wavelengths and the general absorption above 500 nm increased remarkably as Al content increased. For the Si-69at.%Al films, however, an absorption plateau appeared between 300 nm to 700 nm and a second weak and broad absorption peak appeared at around 900 nm. The results are analysed and compared with the optical absorption predicted by various effective medium theories.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 648: Symposium P – Growth, Evolution & Properties of Surfaces, Thin Films, and Self Organized Structure , 2000 , P3.47
Copyright
Copyright © Materials Research Society 2001

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