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Multilayers and Multiturn Coils of YBaCuO/MgO/YBaCuO Layers Prepared by Multitarget Sputtering

Published online by Cambridge University Press:  26 February 2011

R. Wunderlich
Affiliation:
Technical University Hamburg-Harburg, Dept. of Semiconductor Technology, Eiβendorfer Straβe 42, 2100 Hamburg 90, Federal Republic of Germany
J. Kleinitzke
Affiliation:
Technical University Hamburg-Harburg, Dept. of Semiconductor Technology, Eiβendorfer Straβe 42, 2100 Hamburg 90, Federal Republic of Germany
B. Meyer
Affiliation:
Technical University Hamburg-Harburg, Dept. of Semiconductor Technology, Eiβendorfer Straβe 42, 2100 Hamburg 90, Federal Republic of Germany
J. Müller
Affiliation:
Technical University Hamburg-Harburg, Dept. of Semiconductor Technology, Eiβendorfer Straβe 42, 2100 Hamburg 90, Federal Republic of Germany
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Abstract

The deposition of large area multilayers with smooth surfaces is an important topic for the realisation of high quality multiturn coils for flux transformers. We have developed a co-sputtering process from two metallic targets for the deposition of large areas of extremely smooth YBaCuO thin films. Conditions for epitaxial growth of MgO layers on YBaCuO have been investigated. Epitaxial multilayers with good electrical properties (Tc,o > 82 K) have been fabricated.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

[1] Wellstood, F. C., Kingston, J. J., Ferrari, M. J., and Clarke, J., Appl. Phys. Lett. 57, 1930 (1990)Google Scholar
[2] Oh, B., Koch, H., Gallagher, W. J., Robertazzi, R. P., and Eidelloth, W., Appl. Phys. Lett. 59, 123 (1991)Google Scholar
[3] Lee, A. E., Burch, J. F., Simon, R. W., Luine, J. A., Hu, R., and Schwarzbek, S. M., IEEE Trans. Magn. Vol. 27, No. 2, 1365 (1991)Google Scholar
[4] Tanaka, S., Nakanishi, H., Matsuura, T., Higaki, K., Itozaki, H., and Yazu, S., IEEE Trans. Mag. Vol. 27, No. 2, 1607 (1991)Google Scholar
[5] Wunderlich, R., Kleinitzke, J., Meyer, B., and Müller, J., to be publishedGoogle Scholar
[6] Enami, H., Shinohara, T., Kawahara, N., Kawabata, S., Hoshizaki, H., and Imura, T., Jap. J. Appl. Phys. 29, No. 5, L782 (1990)Google Scholar