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Nanometer Lithography by Fast Atom or Ion Beam Milling

Published online by Cambridge University Press:  25 February 2011

G. Devaud ,
J. Fleming  and
K. Douglas
G. Devaud
Affiliation:
Department of Physics, University of Colorado, Boulder, CO 80309
J. Fleming
Affiliation:
Department of Physics, University of Colorado, Boulder, CO 80309
K. Douglas
Affiliation:
Department of Physics, University of Colorado, Boulder, CO 80309
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Abstract

We have produced nanometer scale patterning (nanostructures) by metal shadowing of two-dimensional protein crystals (S-layers), followed by milling with ions or fast atoms. In this parallel process, the metal overlayer is formed into a metal screen consisting of hexagonal arrays of 10 nm size holes with a 20 nm periodicity. We have studied the time evolution of the milling process, and temperature effects. Nanostructure formation may be due to preferential sputtering of the troughs relative to the crests of the metallized S-layer. The effect of temperature on pattern formation indicates that thermal diffusion is also important.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 171
Copyright
Copyright © Materials Research Society 1992

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