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On the Coercivity of Granular Fe-SiO2 Films*

Published online by Cambridge University Press:  21 February 2011

S. H. Liou
Affiliation:
Department of Physics and Astronomy University of Nebraska-Lincoln, Lincoln, NE 68588-0111
C. H. Chen
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
H. S. Chen
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
A. R. Kortan
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
C. L. Chien
Affiliation:
Department of Physics and Astronomy The Johns Hopkins University, Baltimore, MD 21218
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Abstract

The coercivity of granular Fe embedded inside an SiO2 matrix was as high as 3 kOe at 6K, and 1.1 kOe at 300K. In this study, we observed a linear temperature (T) dependence of the coercivity for the samples prepared at a high substrate temperature (773K), and a T1/2 dependence of the coercivity for the sample prepared at a low substrate temperature (473K). This indicates that the microstructures of films prepared at different substrate temperatures are not the same. This phenomenon can be explained if we assume that there are interconnections between particles for the sample prepared at a high substrate temperature. We looked for evidence of interconnections between particles with transmission electron microscopy (TEM).

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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Footnotes

*

This work is partly supported by ONR Contract No:N00014-85-K-0175.

References

REFERENCES

[1] Abeles, B., Cohen, R.W., and Cullen, G.W., Phys. Rev. Lett. 17, 632 (1966).Google Scholar
[2] Abeles, B., Sheng, P., Couts, M.D., and Arie, Y., Adv. Phys. 24, 407 (1975).CrossRefGoogle Scholar
[3] For a review, see Perenboom, J. A. A. J., Wyder, P., and Meier, F., Phys. Rep. 78, 173 (1981).Google Scholar
[4] Liou, S.H., and Chien, C.L.; Appl. Phys. Lett. 52, 512 (1988).Google Scholar
[5] Kneller, E.F., and Luborsky, F.E.; J. Appl. Phys. 34, 656 (1963).Google Scholar
[6] Eagle, D.F., and Mallinson, J.C.; J. Appl. Phys. 38, 995 (1967).CrossRefGoogle Scholar
[7] Jacobs, I.S. and Bean, C.P., in Magnetism III, edited by Rado, G.T. and Suhl, H. (Academic, New York, 1963), p. 275.Google Scholar