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Optical Fiber Pyrometry with in-Situ Detection of Wafer Radiance and Emittance—Accufiber's Ripple Method

Published online by Cambridge University Press:  21 February 2011

A. T. Fiory ,
C. Schietinger ,
B. Adams  and
F. G. Tinsley
A. T. Fiory
Affiliation:
AT&T Bell Laboratories, Murray Hill NJ 07974
C. Schietinger
Affiliation:
Accufiber Division, Luxtron Corporation, Beaverton OR 97005.
B. Adams
Affiliation:
Accufiber Division, Luxtron Corporation, Beaverton OR 97005.
F. G. Tinsley
Affiliation:
Accufiber Division, Luxtron Corporation, Beaverton OR 97005.
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Abstract

A two-channel optical-fiber pyrometry technique for simultaneous measurement of thermal radiance and emittance was used to measure and control the temperature of silicon wafers heated by quartz-halogen-tungsten lamps in various rapid-thermal processors, including an A.G. Associates Heatpulse. The ripple method dynamically determines emittances by sensing time-dependent components in radiation from the lamps and radiation reflected by the wafer surface. Wafers were coated with films of various textures and patterns to test the technique over a range of surface emittances spanning about an order of magnitude. Temperature accuracies of at least ±5°C are achievable from 650°C to 1050°C, and above, for pyrometry at lμm wavelength.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 303: Symposium G – Rapid Thermal and Integrated Processing II , 1993 , 139
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

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