Hostname: page-component-7bb8b95d7b-lvwk9 Total loading time: 0 Render date: 2024-09-16T20:41:51.007Z Has data issue: false hasContentIssue false

Optical Spectroscopic Profiling of Ion Beam Sputtering

Published online by Cambridge University Press:  16 February 2011

J. D. Klein
Affiliation:
EIC Laboratories, Norwood, MA 02062
A. Yen
Affiliation:
EIC Laboratories, Norwood, MA 02062
Get access

Abstract

The optical emission spectra resulting from ion beam sputtering a BaTiO3 target were observed as a function of position. A collimated optical fiber bundle parallel to the plane of the sputter target was translated vertically and horizontally to spectroscopically profile the sputter process. The Ar contours provide an image of the incident beam and its distortion by the presence of the target. Comparison of the Ar and O contours indicate that the oxygen atmosphere in the vicinity of the target is determined by sputtering events as well as the incident beam. The shapes of the Ba and Ti contours are elliptical with some differences in intensity gradients. Comparison is made with species contours observed during rf sputtering of an Y-Ba-Cu-O target.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Li, P. and T.-Lu, M., Appl. Phys. Lett 5, 2336 (1990).Google Scholar
2. Klein, J.D., Yen, A., and Clauson, S.L., Appl. Phys. Lett. 56, 94(1990).Google Scholar
3. Klein, J.D., Yen, A., and Clauson, S.L., J. Appl. Phys. 67, 6389 (1990).Google Scholar
4. Matsuda, Y., Yamamura, Y., Ueda, Y., Uchino, K., Muraoka, K., Maeda, M., and Akazaki, M., Jpn. J. Appl. Phys. 25, 8 (1986).Google Scholar
5. Haring, R.A., Pedrys, R., Haring, A., and De Vries, A.E., Nucl. Instr. & Meth. B4, 40 (1984).Google Scholar
6. Brauer, G., Hasselkamp, D., Kruger, W., and Scharmann, A., Nucl. Instr. &Meth. B12, 458 (1985).Google Scholar
7. Fleddermann, C.B., J. Appl. Phys. 67, 3815 (1990).Google Scholar
8. Klein, J.D. and Yen, A., J. Appl. Phys. 68 4879 (1990).Google Scholar
9. Klein, J.D. and Yen, A., submitted to J. Vac. Sci. Technol. A (1991).Google Scholar
10. Klein, J.D. and Yen, A., J. Vac. Sci. Technol. A 8 1 (1990).Google Scholar
11. Eom, C.B., Sun, J.Z., Yamamoto, K., Marshall, A.F., Luther, K.E., Geballe, T.H., and Laderman, S.S., Appl. Phys. Lett. 55, 595 (1989).Google Scholar
12. Rossnagel, S.M. and Cuomo, J.J. in Thin Film Processinga nd Characterizationo f High-Temperature Superconductors, ed. by Harper, J.M.E., Colton, R.J., and Feldman, L.C., AIP Conference Proc. No. 165 (American Institute of Physics, New York, 1988) p. 106.Google Scholar