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Organometallic Precursors to Vanadium and Titanium Carbonitride

Published online by Cambridge University Press:  25 February 2011

Francois Laurent ,
Christophe Daures ,
Lydie Valade ,
Robert Choukroun ,
Jean-Pierre Legros  and
Patrick Cassoux
Francois Laurent
Affiliation:
CNRS Laboratoire de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex, France
Christophe Daures
Affiliation:
CNRS Laboratoire de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex, France
Lydie Valade
Affiliation:
CNRS Laboratoire de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex, France
Robert Choukroun
Affiliation:
CNRS Laboratoire de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex, France
Jean-Pierre Legros
Affiliation:
CNRS Laboratoire de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex, France
Patrick Cassoux
Affiliation:
CNRS Laboratoire de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex, France
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Abstract

We repon on the syntheses, structural and thermoanalytical studies of two titanium complexes CpTiCl2N(SiMe3)2 and FTi[N(Sime3)2]3 and one vanadium complex V(NEt2)4. CpTiCl2N(SiMe3)2 has been used in a hot wall CVD reactor as a precursor to titanium nitride. Thin films of typically 1 XPS in thickness have been deposited at 600°C on glass, silicon and tool steel. XPS analyses of the deposits show titanium carbonitride to be formed. The new FTi[N(Sime3)2]3 complex can also be used as a precursor to titanium nitride. V(NEt2>4 led at 500°C to the deposition of vanadium carbonitride characterized by XPS analysis. Films tended to contain excess free carbon.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 271: Symposium N – Better Ceramics Through Chemistry V , 1992 , 875
Copyright
Copyright © Materials Research Society 1992

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References

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